Published: 31 March 2008

Thermaly mechanisms in electrostaticaly actuated microelectromechanical structures

S. Šeržentas1
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Abstract

The paper reports results of the performed research work related to the deformations and stability of Al-Si parallel-plate electrostatic microactutors fabricated on silicon-on-insulator (SOI) wafer and subjected to uniform temperature changes. Presented research includes measurements of the deformation of Si beam with deposited Al thin-film microstructures as a function of temperature changes using Electronics Speckle Pattern Interferometry (ESPI) and a custom-built thermal module that is covered by optical beam splitter window to allow optical access

About this article

Received
08 January 2008
Accepted
28 February 2008
Published
31 March 2008
Keywords
actuator
electrostatic
stress
thermal expansion
thin film
interferometry